The MEC was awarded a grant by the EPSRC under the programme Access to Nanoscience and Nanotechnology equipment to provide the academic research base in the UK with free access, for the period of 1st October 2008 to 30th September 2012, to the following equipment:

• CrossBeam® FIB/SEM system, Zeiss XB1540, combining a Gemini® Field Emission Scanning Electron Microscope (FESEM) with a Focused Ion Beam (FIB) column allowing 3D analysis while milling, depositioning and etching. The system is also equipped with Raith lithography software, EDX, EBSD and STEM detectors for advanced imaging and compositional analysis, micro manipulator and software for TEM sample preparation, a multi-channel gas injection system for material deposition and enhanced or selective etching, and a range of sample preparation equipment.

• Step and Flash® (S-FIL) Nano Imprint Lithography (NIL) system, Imprio® 55, that allows nanopatterning of up to 8'' wafers. In combination with the FIB’s template nanopatterning capabilities, the S-FIL UV-imprinting system is used to replicate critical experimental nanostructures in minutes.

• Nanometrology equipment: an AFM/STM system (XE-100) equipped with a heating/cooling stage and an enhanced acoustic enclosure, and 3D Interferometric Profiling Microscope (MicroXAM-100-HR).

• Electroforming system, SA/1m, for replicating in nickel masters produced by UV and thermal nanoimprinting.

• Thermal replication equipment: a thermal imprinting system (Mikrotechnik HEX03) and a micro injection-moulding system (Battenfeld Microsystem 50).

• Manufacturing of UV and thermal nanoimprinting masters (4 per year).